- Posted by Francisco Javier Aparicio Rebollo
- On February 21, 2021
This test is performed to verify the structural quality of the glassivation layer in aluminum metalized semiconductor devices or microcircuits. The glassivation layer is a deposited dielectric film (e.g., CVD, sputtered of electron beam evaporated glass or nitride, etc.) and its good condition is essential to avoid such problems as electromigration.